SU-8 photoresist
For the heavy Soviet ground attack aircraft, see Sukhoi Su-8
SU-8 Photoresist description
SU-8 is a commonly used negative photoresist. It is a very viscous polymer that can be spun or spread over a thickness ranging from 1 micrometer up to 2 millimeters and still be processed with standard mask aligner. It can be used to pattern high aspect ratio (>20) structures.[1] Its maximum absorption is for ultraviolet light with a wavelength of 365 nm. When exposed, SU-8's long molecular chains cross-link causing the solidification of the material.
SU-8 is mainly used in for fabrication of microfluidics and MEMS parts. It is also one of the most bio-compatible materials and is often used in bio-MEMS.
Links for SU-8
THE SU8 HOMEPAGE
SU-8: Thick Photo-Resist for MEMS A webpage with a lot of material data and process tricks.
SU-8 supplier
MSDS
References
- ↑ Liu, J.; Cai, B.; Zhu, J.; Ding, G.; Zhao, X.; Yang, C.; Chen, D. "Process research of high aspect ratio microstructure using SU-8 resist" Microsystem Technologies 2004, V10, (4), 265.